Line Width; Critical Dimension (CD) Measurement

Line width and critical dimension (CD) measurement equipment are used in the semiconductor industry to measure the dimensions of features on a wafer or substrate. These features include the width of metal lines, the diameter of contact holes, and the size of other patterns. The goal of CD measurement is to ensure that the dimensions of these features are within the specified tolerance, as any deviation from the desired dimension can affect the performance of the device. There are several types of CD measurement equipment available, including optical CD measurement systems, scanning electron microscopes (SEMs), and X-ray lithography systems. Optical CD measurement systems use light to measure the dimensions of features on a substrate and are widely used for their accuracy, speed, and ease of use. SEMs use electrons to image the surface of the substrate and provide high-resolution images of the features. X-ray lithography systems use X-rays to image the features on the substrate and are used for high-volume production. In the semiconductor industry, CD measurement is critical for ensuring the quality and reliability of the devices manufactured, and the equipment used for this measurement is an important part of the manufacturing process.